InGaAs finFETs for future CMOS

نویسنده

  • XIN ZHAO
چکیده

The last few years have witnessed an explosion of interest in exploring the use of III-Vs to advance logic CMOS beyond the point of diminishing returns for silicon technology. There is now a tantalizing possibility that these compound semiconductors will enter the CMOS roadmap. If they do, the benefits could be huge – they could extend Moore’s Law by two or three more nodes, a huge contribution in itself, and they could also hold the key to revolutionary new technologies that are enabled by the integration of III-Vs on silicon. This combination could create systems that combine logic, terahertz sensing, imaging and communications, as well as optical functions.

برای دانلود رایگان متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Novel Heterogeneous Integration Technology of III–V Layers and InGaAs FinFETs to Silicon

wileyonlinelibrary.com recent rich advancements in strain engineering, [ 2 ] metal gate stack with high-k dielectrics, [ 3 ] and transistor architecture, [ 4 ] up to the development of Si FinFET devices adopted in current CMOS technology. It is expected that downscaling of Si-based technology will eventually reach its physical limits below 10 nm technology node, a bottleneck that research now t...

متن کامل

FinFET Circuit Design

Fin-type field-effect transistors (FinFETs) are promising substitutes for bulk CMOS at the nanoscale. FinFETs are double-gate devices. The two gates of a FinFET can either be shorted for higher perfomance or independently controlled for lower leakage or reduced transistor count. This gives rise to a rich design space. This chapter provides an introduction to various interesting FinFET logic des...

متن کامل

Leakage Current And Dynamic Power Analysis Of Finfet Based 7t Sram At 45nm Technology

As technology is scaled down, the importance of leakage current and power analysis for memory design is increasing. In this paper, we discover an option for low power interconnect synthesis at the 45nm node and beyond, using Fin-type Field-Effect Transistors (FinFETs) which are a promising substitute for bulk CMOS at the considered gate lengths. We consider a mechanism for improving FinFETs eff...

متن کامل

Neutron-induced strike: Study of multiple node charge collection in 14nm FinFETs

FinFETs have replaced the conventional bulk CMOS transistors in the sub-20nm technology. One of the key issues to consider is, the vulnerability of FinFET based circuits to multiple node charge collection due to neutron-induced strikes. In this paper, we perform a device simulation based characterization study on representative layouts of 14nm bulk FinFETs in order to study the extent to which ...

متن کامل

Technology CAD of Nanowire FinFETs

The potential applications of semiconductor nanowire (NW) field-effect transistors as potential building blocks for highly downscaled electronic devices with superior performance are attracting considerable attention. In the area of Technology CAD (TCAD) of nanowire FinFETs, it is fair to say that there have been very little or no reports are available in the literature on TCAD modeling of nano...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

عنوان ژورنال:

دوره   شماره 

صفحات  -

تاریخ انتشار 2016